| Course title | |||||
| 無機反応化学特論 [Advanced Inorganic Reaction] | |||||
| Course category | courses for master's programs | Requirement | Credit | 2 | |
| Department | Year | ～ | Semester | Spring | |
| Course type | Spring | Course code | 1060202 | ||
| Instructor(s) | |||||
| 村上 尚, 熊谷 義直 [MURAKAMI Hisashi, KUMAGAI Yoshinao] | |||||
| Facility affiliation | Faculty of Engineering | Office | Email address | ||
| Course description |
| In this lecture, we aim to understand the basic knowledges of thin film technologies such as fabrication of thin films, characterization and applications, which are indispensable to the present electronics area. Especially, we will study about crystal growth of semiconductor materials, basic theory of thin film formation and various characterization methods. |
| Expected Learning |
| Nothing |
| Course schedule |
|
#1 Introduction #2 Basic of thin films #3 Crystal growth of thin film 1 #4 Crystal growth of thin film 2 #5 Crystal growth of thin film 3 #6 Crystal growth of thin film 4 #7 Characterization of thin film 1 #8 Characterization of thin film 2 #9 Characterization of thin film 3 #10 Function and application of thin film 1 #11 Function and application of thin film 2 #12 Function and application of thin film 3 #13 Thin film growth of nitride semiconductors 1 #14 Thin film growth of nitride semiconductors 2 #15 Exercise |
| Prerequisites |
| Nothing |
| Required Text(s) and Materials |
|
Nothing I will distribute the materials through moodle. |
| References |
| Nothing |
| Assessment/Grading |
| Attitude for the learning, reports, exercise score |
| Message from instructor(s) |
| Course keywords |
| Thin film engineering, Semiconductor crystal, epitaxial growth, vapor phase epitaxy |
| Office hours |
| 10:00~16:00 on Monday |
| Remarks 1 |
| Remarks 2 |
| Related URL |
| Lecture Language |
| Japanese |
| Language Subject |
| Last update |
| 3/26/2018 10:17:59 AM |