Course title | |||||
知的財産権・特許法 [Intellectual Property and Patent Law] | |||||
Course category | Liberal Arts and Fundamental Studies | Requirement | Credit | 2 | |
Department | Year | 2~4 | Semester | 3rd | |
Course type | 3rd | Course code | 020285 | ||
Instructor(s) | |||||
矢野 卓哉, 鈴木 俊之 [YANO Takuya, SUZUKI Toshiyuki] | |||||
Facility affiliation | Graduate School of Engineering | Office | afjgxte/L1151 | Email address |
Course description |
Intellectual property has become a source of global competitiveness as it is a central issue in the US and China conflict. We need to pay more attention to the research and development and business fields concerning the intellectual property of others and their own intellectual property. This course is a class by a teacher with practical experience that is to be held as a subject of "science and technology and society" classified as "science technology for sustainable planet". The instructor in charge is engaged in the business handling intellectual property as a patent attorney, and conducts classes taking advantage of actual knowledge and practical knowledge related to patent attorneys' work and examination by Japanese patent office. |
Expected Learning |
Understand the role of the Intellectual Property in terms of R&D. For more information, see Japanese language syllabus |
Course schedule |
1. Guidance & Introduction to Intellectual property 2. Intellectual property law (Patents,Utility models,Designs,Trademarks) 3. Patent law I 4. Patent law II 5. Patent law III 6. Patent law IV 7. Patent law V 8. Patent law VI 9. Summary, Midterm examination 10.Understand the outline of the Utility models law system. 11.Understand the outline of the Designs law system. 12.Understand the outline of the Trademarks law system. 13.Paris conventions & Patent Cooperation Treaty 14.Integrated study I 15.Integrated study II |
Prerequisites |
none In addition to 30 hours in the class, students are recommended to prepare for and revise the classes spending the standard amount of time as specified by the University. |
Required Text(s) and Materials |
標準特許法 第4版 高林 龍(有斐閣)、知的財産権法文集(平成30年改正版 発明推進協会) |
References |
工業所有権法(上)第2版 中山信弘、なるほど日本の素敵な製品(経済産業省 特許庁)、「意匠」(有斐閣 高田忠)、「商標」第6版(有斐閣 網野誠)、パリ条約講和第9版(後藤晴男 発明協会)、特許協力条約第6版(橋本良郎 発明協会)、『注解パリ条約』(ボーデンハウゼン"Guide to the Application of the Paris Convention for the Protection of Industrial Property As Revised at Stockholm in 1967")、商品形態の保護と不正競争防止法(現代産業選書 牛木理一)、著作権法概説第2版(田村義之 有斐閣) |
Assessment/Grading |
Class Participation, Midterm Examination, Final Examination |
Message from instructor(s) |
Please see Japanese language syllabus |
Course keywords |
Reseach & Development, patents, utilty models, designs,know-how,trade dress copy right. |
Office hours |
24 hours available. |
Remarks 1 |
takuya133639@yahoo.co.jp |
Remarks 2 |
Related URL |
特許庁HP http://www.jpo.go.jp/indexj.htm 特許情報検索 https://www.j-platpat.inpit.go.jp/web/all/top/BTmTopPage |
Lecture Language |
Japanese |
Language Subject |
Last update |
2/27/2020 11:06:27 AM |